|
2008
29. P. Arosio, V. Busini, G. Perale, D. Moscatelli, and M. Masi, “Zero-Order Model of Resorbable Device Degradation and Drug Release. Part I”, Polymer International, 2008, 57, 912-920, 2008.
28. C. Punta, D. Moscatelli, O. Porta, F. Minisci, C. Gambarotti and M. Lucarini, “Selective Aerobic Radical Epoxidation of α-Olefins Catalyzed by N-Hydroxyphtalimide”, Mechanism in Homogeneous and Heterogeneus Epoxidation Catalysis, 2008 Elsevier B.V., 209-220.
27. L. Zamolo, V. Busini, D. Moiani, D. Moscatelli and C. Cavallotti, “Molecular Dynamic Investigation of the interaction of Supported Affinity Ligands with Monoclonal Antibodies”, Biotechnology Progress, 2008.
2007
26. D. Moscatelli, M. Dossi, C. Cavallotti and G. Storti, “Ab Initio Calculation of the Propagation Kinetics in Free Radical Polymerization: Chain Length and Penultimate Effects”, Macromolecular Symposia, 2007, 259, 337-347.
25. Y.M Harshe, G. Storti, M. Morbidelli, S. Gelosa, and D. Moscatelli, “Modeling polycondensation of lactic acid”, Macromolecular Symposia, 2007, 259, 116-123.
24 Y. M. Harshe, G. Storti, M. Morbidelli, S. Gelosa, D. Moscatelli, “Polycondensation kinetics of lactic acid”, Macromolecular Reaction Engineering, 2007, 1 (6), 611.
23. A. Fiorucci, D. Moscatelli, M. Masi, “Homoepitaxial silicon carbide deposition processes via chlorine routes”, Surface & Coatings Technology, 2007, 201, 8825-8829.
22. D. Moscatelli, C. Cavallotti, “Theoretical investigation of the gas phase kinetics active during the GaN MOVPE”, Journal of Physical Chemistry A, 2007, 111, 4620-4631.
21 . D. Moscatelli, “Hydrocarbons”, Piccola Treccani, Istituto dell’Enciclopedia Italiana Treccani, 2007.
20. C. Cavallotti, D. Moscatelli, Chapter 1.1: “Theoretical Aspects” and Chapter 1.2: “The Typology and Structure of Hydrocarbons”, Enciclopedia degli Idrocarburi, Istituto dell’Enciclopedia Italiana Treccani, 2007.
19. A. Fiorucci, D. Moscatelli, M. Masi, “ P-Doping Mechanism in HTCVD Silicon carbide”, Journal of Crystal Growth, 2007, 303, 349-351.
18. A. Fiorucci, D. Moscatelli, M. Masi, “Mechanism of N-Doping of silicon carbide epitaxial films”, Journal of Crystal Growth, 2007, 303, 345-348.
17. C. Punta, D. Moscatelli, O. Porta, F. Minisci, F. Recupero, C. Gambarotti, M. Lucarini, “Selective Aerobic Radical Epoxidation of α-Olefines Catalyzed by N-Hydroxyphtalimide (NHPI)”, Prepr. Pap-Am. Chem. Soc., Div. Petr. Chem. 2007, 52 (2), 240.
2006
16. D. Moscatelli, C. Cavallotti and M. Morbidelli, “Prediction of molecular Wight Distributions Based on Ab inizio Calculations: Application to the High Temperature Styrene Polymerization”, Macromolecules 2006, 39, 9641-9653.
15. V. Busini, D: Moiani, D. Moscatelli, L. Zamolo, C. Cavallotti, “Investigation of the influence of spacer arm on the structural evolution of affinity ligands supported on agarose”, Journal of Physical Chemistry B 2006, 110, 23564-23577.
14. C. Pelosi, G. Attolini, M. Bosi, D. Moscatelli, A. Veneroni, M. Masi, “A new MOVPE reactor for heteroepitaxial GaAs deposition on large-scale Ge substrates”, Journal of Crystal Growth 2006, 287, 652-655.
2005
13. D. Moscatelli, P. Caccioppoli and C. Cavallotti, “Ab Initio study of the gas phase nucleation mechanism of GaN”, Applied Physics Letters, 2005, 86.
12. D. Moscatelli, A. Veneroni, C. Cavallotti, M. Masi, M. Bosi, G. Attolini, C. Pelosi, “Designing a large scale CVD reactor for GaAs growth on Ge substrates by multi-hierarchy modeling”, Crystal Research and Technology, 40, No. 10-11, 987-992, 2005.
11. A. Veneroni, F. Omarini, D. Moscatelli and M. Masi, S. Leone, M. Mauceri, G. Pistone and G. Abbondanza, “Modeling of epitaxial silicon carbide deposition”, Journal of Crystal Growth, 295-300, 275, 2005.
10. A. Veneroni, D. Moscatelli, M. Masi, “Modeling of large scale horizontal reactor for silicon epitaxy”, Journal of Crystal Growth, 289-293, 275, 2005.
9. C. Cavallotti, D. Moscatelli, A. Veneroni, “A Multiscale study of the epitaxial CVD of Si from Chlorosilanes”, International Series of Numerical Mathematics, vol. 149, 29-39, 2005, Birkhäuser Verlag Basel/Switzerland.
8. C. Cavallotti, M. Di Stanislao, D. Moscatelli and A. Veneroni, “Materials computation towards technological impact: the multiscale approach to thin films deposition”, Electrochimica Acta, 50, 4566-4575, 2005.
7. D. Moscatelli, P. Caccioppoli and C. Cavallotti, “A Multiscale study of the MOCVD of GaN”, EUROCVD 15, A. Devi, R. Fischer, H Parala, M. Allendorf, M. Hitchman, ISBN 1-56677-427-6, Pagg. 95-102, 2005.
2004
6. C. Cavallotti, D. Moscatelli, and S. Carrà, “Theoretical investigation of the low and high temperature MOVPE of Zinc Selenide”, Journal of Physical Chemistry A, Vol. 108(7), 1214-1223, 2004.
5. C. Cavallotti, D. Moscatelli, M. Masi and S. Carrà, “Accelerated decomposition of gas phase Metal Organic molecules determined by radical reactions”, Journal of Crystal Growth, 363-370, 266, 2004.
4. M. Rondanini, C. Cavallotti, D. Moscatelli, M. Masi and S. Carrà, “A Combined Fluid Dynamic and 3D Kinetic Monte Carlo Investigation of the Selective Deposition of GaAs and InP”, Journal of Crystal Growth, 52-58, 272, 2004.
2003
3. D. Moscatelli, C. Cavallotti, M. Masi and S. Carrà, “A quantum chemistry investigation of the gas phase and surface chemistry of the MOVCD of ZnSe”, Journal of Crystal Growth, 31-36, Vol. 248, 2003.
2. C. Cavallotti, D. Moscatelli, “Esplorare la chimica con la meccanica quantistica”, Storia della Scienza, vol. IX, Istituto dell’Enciclopedia Italiana Treccani, 2003.
1. D. Moscatelli, C. Cavallotti, M. Masi and S. Carrà, “Surface and gas phase chemistry of the MOCVD of ZnSe”, Chemical Vapor Deposition XVI and EUROCVD 14, M. Allendorf, F. Maury, F. Teyssandier, ISBN 1-56677-378-4, Pagg. 15-21, Vol. 1.
|
